The
BCG365 is a versatile, low cost, precision crystal growth system, designed
for use with Bridgman,  Czochralski
and RF Float Zone crystal growth techniques. It is ideal for vacuum annealing,
or for the growth of a wide range of metals, alloys, semiconductors and
ionic salts.
The BCG365 has been carefully designed to allow easy access to the crucible,
and give a clear view of the growth area. Combined with the short heating
and cooling cycles, this makes the system particularly useful for the
teaching laboratory, and for research and development applications.
The melt and growth area is contained within double walled, water cooled,
transparent chamber assembly mounted on an aluminum alloy cast frame.
This frame is supported on castors for easy movement and has easy levelling
toes for final positioning. The main frame supports the instrument assembly
together with all services, power, water, etc.
The chamber and furnace assemblies have been designed to give easy access
to the crucible for charge loading and unloading.
In addition, the transparent walls allow continuos visual assessment of
the growth conditions to be carried out throughout the run, avoiding the
need for complex and inexpensive temperature control equipment.
The equipment is supplied as a modular unit which may be added to at any
stage. The basic unit consists of the main frame and Bridgman lowering
mechanism which allows the crucible or mould to be steadily raised or
lowered relative to the heating source.
The three basic systems, are then made by adding the appropriate chamber
and heating source. Two different chamber sizes are available, of 85 mm
and 165 mm internal diameter; the resistance heating option is only available
with the 165 mm chamber. Further optional accessories may be added to
any of the three basic systems at any time to further increase their versatility.
Intended
primarily for FR induction heating, a resistance heated option is available
as an economical alterna-- tive covering a lower range of temperatures
for applications not requiring float zone techniques.
Using
the RF induction heating system, charge temperatures of up to 1800°C
may be used (up to 3000°C if the Float Zoner option is fitted). It
can be used with vacuum, inert, oxidizing or reducing atmospheres, provided
that appropriate refractory furniture and susceptors are chosen.
The resistance heating option allows temperatures of up to 1050°C,
and may be used with inert, neutral or oxidizing atmospheres.
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